Concept demo · Not an official GCE Market publication · Illustrative data must be verified
Concept visualization of semiconductor metrology equipment

Precision Rebuilt.
Performance Proven.

GCE re-engineers KLA 8xxx CD-SEM systems to meet original factory specifications for the most demanding fab environments.

Wafer Size 3-8" Wafers
Substrates Multiple
Resolution 4nm
Magnification 400kx

System Configurator

Parameter input: Substrate & Wafer Dimension

grid_view

Substrate Type

data_usage

Wafer Size

Platform Selection

Select model for detailed specifications

Illustrative shared CD-SEM equipment concept
Illustrative comparison profile

KLA 8100XPR

Enhanced resolution and throughput for advanced node monitoring.

Resolution
4nm
Throughput
40 wph
Stage Accuracy
± 1.0 µm
Accel Voltage
200 - 1000V

Component Level Tear-down

Every system undergoes a rigorous 240-point inspection. We evaluate vacuum integrity, electron optics, and mechanical stage assemblies against strict OEM baselines. Worn components are not just noted; they are targeted for replacement.

Inspection Points
240+
Vacuum Check
< 10⁻⁷ Torr